Vlákno názorů k článku Intel zřejmě přiznal, že jeho 1,8nm křemíková technologie je horší než 2nm proces od TSMC od DieGo ForEx - v teto souvislosti clanek o nove mašině TWINSCAN...

v teto souvislosti clanek o nove mašině TWINSCAN EXE:5000 od ASML nebude?

€350 million (2x vice nez predchozi)

The new platform, known as EXE, offers chipmakers a CD of 8 nm. That means they can print transistors 1.7 times smaller – and therefore achieve transistor densities 2.9 times higher – than they can with NXE systems.

After a decade of R&D, ASML shipped the first modules of the first High NA EUV lithography system to Intel in December 2023.

Installation of the first 150,000-kilogram (331,000-pound) system required 250 crates, 250 engineers and six months to complete

Because of their anamorphic optics, EXE systems have exposure fields half the size of their NXE predecessors. It therefore takes twice as many exposures to pattern a single wafer.

Twice as many exposures could have meant twice as long to print a wafer. Instead, we took it as a challenge. The solution? Much faster wafer and reticle stages. The wafer stage in an EXE system accelerates at 8g, twice as fast as the NXE’s wafer stage. And the EXE’s reticle stage accelerates four times faster than the NXE’s – 32g, the equivalent of a race car going from 0 to 100 km/h in 0.09 seconds.

(https://www.asml.com/en/news/stories/2024/5-things-high-na-euv)